Abstract
AbstractThe extended x-ray absorption fine structure (EXAFS) above the Ta L3-edge on tantalum oxide capacitor films has been measured. Four kinds of tantalum oxide films were studied: as-deposited (amorphous), dry 02 annealed (crystalline), 02-plasma annealed (amorphous) and 2-step (02-plasma + dry O2) annealed (crystalline). From EXAFS analysis, differences in the local structures of tantalum oxide capacitor films, in terms of oxygen deficiency around Ta, were observed in the various annealed films. The leakage current characteristics of tantalum oxide capacitors correspond with the differences in the local structures around Ta. The discussion looks at the relationship between the leakage current characteristics and the local structures around Ta.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
