Abstract
(CrMoNbTaZr)NX coatings were deposited on Si (100) by magnetron sputtering under various N2/(Ar+N2) flow ratios. An X-ray diffractometer, transmission electron microscopy, scanning electron microscopy and atomic force microscopy were used to characterize the crystallinity and microstructure of the films. The elemental composition was characterized by energy dispersive spectroscopy and X-ray photoelectron spectroscopy. The hardness and friction coefficient were respectively determined by nanoindentation and nanoscratch. The sheet resistance was studied using a four-point probe. The results suggest that the crystallinity is strongly influenced by the nitrogen content in the films. The chemical stoichiometry of nitride determines the evolutions of the microstructure, mechanical properties and resistivity. Correlations between the microstructure and the properties of the (CrMoNbTaZr)NX films were studied.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
