Abstract
Surface patterning of some III-V (001) compounds, under ion irradiation, has been
 investigated by means of Atomic Force Microscopy. The III-V(001) surfaces were exposed by
 Ar+ beam with varying incident angles (from 0° to 80° off-normal) with energy 2.0 keV and
 fluence 8.8 x1016 ion/cm2 at room temperature. Depending on the ion incident angle and target
 materials, different kinds of nanostructures have been observed on the surfaces, such as
 nanocavities, nanodots and well-ordered ripples at the oblique incidence angle of irradiation.
 The orientation of the ripples has been found to be incident angle dependent and it elongates
 along the projection of the ion beam on the irradiated surface. The RMS roughness and
 wavelength of the developed nanostructures are dependent on the angle and type of material.
 The results have been discussed in terms of ballistic processes of sputtering and Bradley Harper
 theory for surface modifications.
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