Abstract
We have investigated the effect of high temperature hydrogen annealing on the sidewall morphology of micron-sized trenches formed on a Si(001) substrate by atomic force microscopy. We show that high temperature hydrogen annealing is effective for the flattening of as-etched rough surfaces and yields surfaces having atomic steps and terraces when the annealing temperature exceeds 1000°C. We also found that, during hydrogen annealing, large-scale structural changes accompanied trench corner rounding and occurred through the movement of steps on the sidewall surfaces.
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