Abstract
Recently, a novel approach to sample preparation for microstructure analyses has been introduced where a surface possessing initial notches is eroded by a broad ion beam at gracing angles. In this contribution, details of the evolution of the sample surface and the geometry obtained are investigated in depth, using both simulation and experiments on single-crystalline Si substrates. A framework is introduced which describes the surface by a linear model and allows easy application for given sample preparation tasks. Furthermore, the surface amorphization introduced during sample preparation is evaluated using cross-sectional high-resolution transmission electron microscopy.
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