Abstract
Fe and Fe 3O 4 thin films were grown by radio frequency magnetron sputtering. Fe 2O 3 was used as the target and hydrogen was introduced together with Argon gas to provide a certain reducing atmosphere. By varying H 2/Ar flow ratio, the changes in composition and structure of the thin films from (110) Fe to (111) Fe 3O 4 were observed by X-ray diffraction. The valence states of Fe in the thin films were analyzed by X-ray photoelectron spectroscopy. Magnetization measurements indicate that the Fe thin films grown with low H 2/Ar flow ratios possess large coercive force. It was ascribed to the increasing boundary density and the increasing amount of Fe oxides such as FeO distributed at the boundary.
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