Abstract
Low-energy cluster beam deposition is a new and promising technique used to synthesize new materials. In addition, one important asset of this thin film deposition technique is to allow the film growth of chemically reactive materials in non-UHV vacuum conditions. The authors present obtained on samarium deposits which are very reactive with oxygen. According to transmission electron microscopy, X-ray photoemission and Auger electron spectroscopy, deposition of 3 nm mean diameter Sm clusters allows the growth of samarium films without oxidation in non-UHV vacuum conditions.
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