Abstract

$\mathrm{Ca}{\mathrm{Cu}}_{3}{\mathrm{Ru}}_{4}{\mathrm{O}}_{12}$ (CCRO) is considered a $d$-electron-based heavy-fermion metallic system with intriguing electronic properties. The magnetotransport measurements on metallic CCRO thin films reveal weak antilocalization (WAL) effects; however, it is not straightforward to infer whether the same originates from $e\text{\ensuremath{-}}e$ Coulomb interaction (EEI), spin-orbit interaction (SOI), or both present in CCRO. By evaluating quantum correction to sheet conductance for CCRO metallic thin films in the two-dimensional limit, it is observed that SOI gives rise to a dominant contribution to negative magnetoconductance (MC) in the weak-field regime. Based on weak localization (WL) and WAL analysis, SOI and inelastic scattering lengths (${l}_{so}$ and ${l}_{\ensuremath{\phi}}$) are obtained to be 30 and 74 nm, respectively, which indicates that WAL $({l}_{so}<{l}_{\ensuremath{\phi}})$ remains at play. The anisotropic effect of SOI is reflected in the field-direction-dependent in-plane and out-of-plane MC measurements. The presence of the EEI contribution is evidenced from (i) the linear increment (positive slope) of sheet conductance with $ln(T)$ in the quantum interference regime [only the WAL effect should otherwise show a negative slope with $ln(T)]$ and (ii) $ln(T)$ dependence of the Hall coefficient with a negative slope. Further, in the high-magnetic-field regime where WL or WAL is not valid, MC follows $ln(B)$-type behavior, indicating the presence of EEI. These findings have implications for the basic understanding of quantum magnetotransport properties in the presence of SOI and EEI in CCRO.

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