Abstract
Microporous and mesoporous materials have found great utility as catalysts and adsorption media because of their large internal surface area. Since the discovery of surfactant‐templated mesoporous silica materials in 1992, the new developing periodic mesoporous organosilica material (PMO) has received much attention. In this present work, a PMO material, amino‐functionalized mesoporous silica thin films with 3D hexagonal structure, were synthesized by self‐assembly co‐condensation of tetraethoxy silane (TEOS) and 3‐aminopropyltriethoxysiliane (APTES) precursors in various ratios, in the presence of cetyltrimethyl ammonium bromide acting as the structure‐directing agent. The thin films were characterized by small‐angle X‐ray diffraction, grazing incidence small angle X‐ray scattering, Fourier transform infrared, transmission electron microscope, thermogravimetric analysis, and N2 adsorption. Results show that when the APTES/(TEOS+APTES) ratio was 0.10, the mesoporous organosilica thin film has high degree of order, an average pore size of 2.16 nm, a large BET‐specific surface area of 1560 m2/g and a large pore volume of 0.76 cm3/g.
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