Abstract
A series of CrSiCN coatings with various Si concentrations were deposited on Si(100) wafers, and the influence of Si content on the microstructure, mechanical property and crack resistance of the coatings was investigated by XRD, Raman spectroscopy and nanoindentation. After introducing (CH3)3SiH into precursor from 5sccm to 30sccm, the Si concentration increased from 0.97at.% to 7.00at.% with gradually increasing formation of amorphous SiCx and SiNx. Under low Si concentration (0.97–3.40at.%) condition, solid solution effect and formation of nc-Cr(C,N)/a-SiNx(a-SiCx) architecture caused an increase in hardness from 18.1GPa to 21.3GPa. In contrast, at high Si concentration (5.35–7.00at.%), larger grain separation, which resulted from the increase of a-SiNx(a-SiCx), led to a drop of hardness to a low range of 13.0–13.6GPa and a decrease in compressive stress from 4.74GPa to 2.78GPa. As a result, superior elasticity and high compressive stress prevented the CrSiCN (Si<3.40at.%) coatings from radial crack, whereas the CrSiCN (Si≥3.40at.%) coatings confronted. However, after unloading, unbalance of high compressive stress (4.74 and 4.83GPa) in CrCN and CrSiCN (0.97at.%) coatings initiated cracks parallel to the indenter edge. On account of favorable H/E, H3/E2 and compressive stress, the CrSiCN coating with 2.05at.% Si presented the best mechanical property and crack resistance.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.