Abstract
The trade-off relationships between resolution, sensitivity, and line edge roughness (LER) are the most serious problems in the development of extreme ultraviolet (EUV) resists. Although the sensitivity and resolution have become close to meeting the requirements for the 22 nm node, LER is still far from the targeted value. The enhancement of the chemical gradient in latent images is required for the reduction of LER. In this study, the effects of chemical gradient enhancement methods were evaluated. We examined polymer absorption enhancement, acid generator concentration increase, and flare reduction. Among them, polymer absorption enhancement was the most effective for chemical gradient enhancement.
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