Abstract
Random telegraph noise (RTN) has become an important reliability issue in nanoscale circuits recently. This study proposes a simulation framework to evaluate the temporal performance of digital circuits under the impact of RTN at 16 nm technology node. Two fast algorithms with linear time complexity are proposed: statistical critical path analysis and normal distribution-based analysis. The simulation results reveal that the circuit delay degradation and variation induced by RTN are both >20% and the maximum degradation and variation can be >30%. The effect of power supply tuning and gate sizing techniques on mitigating RTN is also investigated.
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