Abstract
Optical characteristics of anti-reflective surfaces of silicon solar cells with various types of irregularities (microstructured pyramid, nanostructured hole, column and cone) are modeled by the finite-difference time-domain method and experimentally studied. It is shown that surfaces with conical irregularities, which are formed by the method of reactive ion etching in the black silicon formation mode, are the most effective. The expediency of hybrid application of micro- and nanostructured antireflection surfaces in industrial solar cells is discussed.
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