Abstract
In this study, we developed a methodology to evaluate scanning electron microscopy (SEM)-based line edge roughness (LER) metrology. In particular, we used a metrological tilting atomic force microscopy (tilting-mAFM) as LER reference metrology. We analyzed the height-height correlation function (HHCF) of SEM line-edge profiles combining averaging and unbiased correction methods. The direct comparison of our method with tilting-mAFM enabled a precise evaluation of the SEM-based LER metrology. We demonstrated that a combination of unbiased HHCF and averaging methods with appropriate condition enabled relatively precise measurement of three roughness parameters. We observed that, for precise roughness evaluation, reducing noise in the line-edge profiles is important before performing the HHCF analysis and unbiased correction.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
