Abstract
For more than 15 years, Imagine Optic have developed Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors for metrology and imaging applications. These sensors are compatible with a wide range of X-ray sources: from synchrotrons, Free Electron Lasers, laser-driven betatron and plasma-based EUV lasers to High Harmonic Generation. In this paper, we first describe the principle of a Hartmann sensor and give some key parameters to design a high-performance sensor. We also present different applications from metrology (for manual or automatic alignment of optics), to soft X-ray source optimization and X-ray imaging.
Highlights
The emergence of ultrafast Extreme Ultra Violet (EUV) to X-ray sources, namely FreeElectron Laser, High Harmonic Generation, laser-driven betatron and Compton, and the emergence of Diffraction Limited Storage Ring has opened the door to new, exciting experiments in physical, chemical and biological sciences
We firstly focus on the calibration step required to enable absolute WF sensing, and present a broad range of applications: from beamline and optical setup optimization, understanding of some physics phenomena, characterization of EUV to X-ray sources and some phase imaging experiment
The experiment was performed at the Advanced Photon Source (APS), at 12 keV, using the HASO HXR wavefront sensors (WFS) developed by Imagine Optic and Brookhaven National Laboratory (BNL)
Summary
Many of these experiments require an optimum or at least a properly defined beam wavefront (WF). Several X-rays WF sensing techniques have been proposed in the past: grating-based interferometry [1], speckle tracking [2,3], ptychography [4,5,6] and imaged-based wavefront sensing combined with machine learning [7] Among these techniques, Hartmann WF sensing provides several advantages, such as achromaticity, very large dynamic range, real-time wavefront display and ease of use [8,9,10,11]. Results with the Hartmann sensors developed by Imagine Optic are presented
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