Abstract
A buried contact is one of effective techniques to improve the efficiency of solar cells. However, the etching of the patterned front contact on the surface of a solar cell is required. Therefore, we proposed a maskless etching technique using the surface discharge plasma operated at atmospheric pressure. The streamer-like discharge channels, which ignited near a triple junction point between the quartz glass layer, the solar cell, and the gas space, played an essential role in the etching. The etching rate of a silicon solar cell of which the surface had randomly distributed pyramid-like structures, was in the range of 3 - 5 μm /min when the applied voltage was 4.0 kV.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
