Etching behaviour of Makrofol KG in KOH solution

Abstract

The bulk etching rate ν B of Makroffol KG in KOH acqueous solution has been measured for various values of the normality N of the etchant and of the temperature T of the bath. An empirical relationship is given for the dependence of ν B on N and T. The study of the tracks left by light ions allowed the determination of the dependence on the incidence angle of the particle, of Makrofol KG efficiency as track detector. As a consequence a value of ν T ν B ≃1.3 could be obtained for ions of 1–2 MeV, where ν T is the etching rate along the track. A threshold for track registration in Makrofol KG is then deduced around a value of 1500 MeV · cm 2/g for the particle restricted energy loss (REL).