Abstract
In the present paper, the power deposited in the inductively coupled radiofrequency (RF) discharges is investigated by a two-dimensional fluid model. The discharge process was sustained in Ar / O2 gases mixture with 50:50 percentage of mixture volume. The discharge properties in the mixture obtained. An operating RF frequency of 13.56 MHz and applied voltage of 20 kV are simulated. A simple known international design of the reactor was chosen with 5 turn coil. Input power of the reactor was 1500 W. This numerical study done using plasma multiphysics model. Results show that the power deposition shows enhancement in behavior as the pressure increased. Keywords: ICP Plasma, Ar Gas, O2 Gas, Power Deposition, Electric Potential
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