ESR Study of the plasma polymerizations of trimethylsilane and methane

Abstract

Electron Spin Resonance (ESR) was used to study, at the molecular level, the plasma polymerization of trimethylsilane (TMS) and methane. Direct ESR analysis of the plasma coated Al substrate required the use of a novel ESR technique. TMS plasma deposit on Al showed a single broad resonance line near g = 2.003. The signal was stable in vacuum and decayed on exposure to air, with a significant fraction persisting for days. Results show that this signal arises from silicon dangling bonds. Identical TMS signals were observed from films prepared by the DC cathodic or the AF glow discharge method but their decay rates were different. In contrast, the deposition of methane produced two distinct types of carbon-based signals depending upon the method of deposition. TMS or CH4 films deposited by the DC cathodic method showed slow signals decay and high refractive indices value. While the use of Al as the substrate showed plasma-coating radicals, only substrate radicals were observed when PE was used as the substrate. The nature of radicals formed depends not only on the deposition method used but also on the substrate type.