Error analysis of digital virtual mask fabrication technique

Abstract

The digital virtual mask technique based on digital micro-mirror device (DMD) is applied in the field of micro-engineering such as the machining of micro-optical elements. On the premise of universality, the error of digital virtual mask technique is theoretically deduced, combined with the functional diagram used in the experiment. Based on the expanding application of Rayleigh's criterion, the reference of calculating the error of the lithography mask technique is given. And the method of improving the technique is also discussed.