Abstract
Results concerning the magnetic, magnetostrictive, structural, morphological, and topological properties of amorphous and nanocrystalline Fe 73.5Cu 1Nb 3Si 15.5 B 7 thin films deposited using the high power impulse magnetron sputtering (HiPIMS) technique are reported. In as-deposited state, the samples are amorphous, the nanocrystalline state being achieved for samples isothermally annealed at adequate temperatures, in an electric furnace. For the optimum annealing temperature (475 ∘C), a decrease by about 70 % for the coercive magnetic field (50 A/m) and up to 1 order of magnitude for the saturation magnetostriction (~1×10−6), compared to the as-deposited state, was obtained. The X-ray diffractometry (XRD) and scanning electron microscopy (SEM) results for samples thermally treated at 475 ∘C revealed a 53.6 % crystalline volume fraction of α-Fe(Si) nanograins with an average size of about 15 nm and a Si content of 10.78 %, uniformly dispersed in a residual amorphous matrix. Using the saturation magnetostriction values determined using the cantilever deflection method and the crystalline volume fraction of α-Fe(Si) nanograins, the contribution of crystalline phase to the saturation magnetostriction was also determined.
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