Abstract
A holographic lithography method for fabricating large-scale photonic phased array is presented. The large-scale array could be gen- erated using a specially designed holographic optical element and the period could be decreased by half with the help of a half-wave plate. This method provides a convenient way to obtain the photonic array with a smaller period without shortening the recording wavelength. MATLAB simulations and primary experimental results have demonstrated that the phase modulation and nonlinear photoresist response played collectively significant roles in tuning the distribution of the array. The large-scale photonic phased array with a smaller period is an ideal candidate as a Raman substrate. © 2013 Society of Photo-Optical Instrumentation
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