Abstract

Equilibrium helium films adsorbed on solid substrates are investigated. Due to their thickness these films are mainly in the retardation regime where the influence of the roughness of the substrates, δ(x), can be strong enough to be observed. For the definition of δ(x) we use a simple corrugation model. This model is supported by experimental results using the surface plasmon resonance technique to determine the thickness of helium films grown on different Ag surfaces.

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