Abstract
We prepare high quality thin films of β-FeSi2 on silicon substrates by an ArF excimer laser deposition method (ArF-PLD) using ϵ-FeSi alloy targets. Preferentially [100]- oriented β-FeSi2 films were grown on Si(100) surfaces, and the interface between the films and substrates are very smooth. Based on a fact that when iron silicide films are obtained on sapphire substrates in stead of the silicon ones, the films have the same compositions as the target materials, silicon atoms in the β-FeSi2 films must be supplied from the silicon substrates.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.