Abstract
Nanopatterned epitaxial films of upconversion (UC) materials are desirable for various applications such as display lighting, waveguides, and optical imaging. In this study, we demonstrate that a nanopatterned epitaxial film of a UC material can be fabricated by combining a sol–gel process and nanoimprint lithography. An epitaxial KNbO3:Yb3+,Er3+ film is grown on a lattice-matched SrTiO3 single-crystal substrate, which exhibits an approximately 70 times enhanced UC photoluminescence (PL) intensity compared to that of a non-epitaxial KNbO3:Yb3+,Er3+ film grown on a Si substrate. Moreover, the introduction of a nanopattern enhances the UCPL intensity ∼20 times compared to that of a planar film with the same volume of material. Our study paves the way for a better fundamental understanding and expansion in the application of UC materials.
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