Abstract
Treatment of air-cleaved NaCl substrates with distilled water prior to vacuum deposition of the metal has been found to promote the epitaxial growth of continuous thin silver films (30 nm or less) at low temperatures. Well-developed (100) single-crystal silver films have been grown at a substrate temperature as low as 100°C, while randomly oriented polycrystalline films developed at 50°C or below. Changes in nucleation density of silver and cleavage step structure on NaCl due to water treatment were observed by surface decoration methods and are tentatively explained.
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