Abstract
Thin films of tellurium with a thickness up to 4 μm have been grown on monocrystalline tellurium substrates by an electro-deposition method. X-ray diffraction showed that the films deposited at 90°C with a current density of 0.5 mA/cm 2 or less were monocrystalline. Films with a blade-like structure were produced as the deposition current density was increased to 1 mA/cm 2.
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