Abstract
ABSTRACTEpitaxial growth of NiSi2 on (011)Si was investigated by the transmission electron microscopy. Both epitaxial and twin related NiSi2 were formed, with the former being predominant, in samples annealed at 850°C for 1/2 h. The silicides were faceted with {111} interfaces being more prominent than {100} interfaces. Interfacial dislocations were found to be of edge type with 1/6<112> Burgers vectors. The average spacing is about 700 Å which is very close to the theoretically expected value 670 Å.The absence of twins formed on (111) and (111) planes for (011) samples as well as the results obtained for (001) and (111) specimens suggest that there exists a critical resolved shear stress at the interface for the initiation of the formation of twin related NiSi2.
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