Abstract

An epitaxial film of CuScO2, a transparent oxide semiconductor with a delafossite structure, was grown on an α−Al2O3(112¯0) substrate by a pulsed laser deposition method using a single-phase Cu2Sc2Oδ target. A two-dimensional x-ray reciprocal space mapping measurement revealed that the film was single phase with a rhombohedral crystal structure. The film showed six-fold rotational symmetry in the basal plane, indicating that the film had a twinned domain structure. The epitaxial growth of CuScO2[3R](0001) thin films on α−Al2O3(112¯0) substrates is caused by the uniaxial locked epitaxy mechanism along the ⟨1¯21¯0⟩ direction of the film, and the orientation relationships of the film with respect to the substrate were CuScO2[3R](0001)∕∕α−Al2O3(112¯0) and CuScO2[3R][1¯21¯0]∕∕α−Al2O3[88¯01]. The optical transmittance of the film was larger than 65% in the visible/near-infrared regions, while the energy gap for direct allowed transition was estimated as 3.7 eV. The resistivity of the film, 9.3×106Ωcm at room temperature, significantly decreased to 4.0 Ωcm after both substituting Mg2+ ions for Sc3+ and intercalating excess oxygen. The Mg-doped CuScO2+X(0001) thin film showed optical transmittance of larger than 65% in the visible region, and the Seebeck coefficient was positive, indicating a p-type conductivity.

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