Abstract
As-grown Ba 1−xK xBiO 3 (BKBO) epitaxial thin films with a critical temperature of 16.3 K have been successfully prepared at 300°C on SrTiO 3(110) substrates by a high-pressure rf-magnetron sputtering. A preferred orientation of (110) and epitaxial growth of the BKBO film on the substrates were confirmed by X-ray diffraction (XRD) and reflection high-energy electron diffraction (RHEED), respectively.
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