Abstract
As-grown Ba 1−xK xBiO 3 (BKBO) epitaxial thin films with a critical temperature of 16.3 K have been successfully prepared at 300°C on SrTiO 3(110) substrates by a high-pressure rf-magnetron sputtering. A preferred orientation of (110) and epitaxial growth of the BKBO film on the substrates were confirmed by X-ray diffraction (XRD) and reflection high-energy electron diffraction (RHEED), respectively.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.