Abstract
Lithographic machine tools require both high motion accuracy and high motion flexibility. Projection based iterative learning control (P-ILC) is appealing for wafer stages to achieve two goals, simultaneously. P-ILC contains a nonparametric feedforward controller based on ILC, and a parametric feedforward controller with a projection step for feedforward tuning. In this paper, a set-membership based frequency-domain ILC algorithm (SM-F-ILC) is employed in the enhancing P-ILC scheme to improve the performance in the nonparametric feedforward control mode. SM-F-ILC can effectively compensate for repetitive errors, attenuate the nonrepetitive error accumulation and achieve fast convergence speed with model uncertainties. These superiorities also facilitate to improve the performance of P-ILC in the parametric feedforward control mode. The validity of the enhancing P-ILC scheme is demonstrated by experimental results.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
