Enhancing near-field photolithography by surface plasmon polaritons excited from negative-refractive-index nanofilms

Abstract

We report a novel method for enhancing near-field nanophotolithography using negative-refractive-index slabs. In our method, a negative-refractive-index-metal film (NIF) is attached to the plane surface of an aplanatic solid immersion lens (SIL), and the polymer layer is coated on the negative-refractive-index film. The intensity of the transmitted light is enhanced by the surface plasmon polaritons excited in the NIF-polymer composite layer. The numerical results based on the vector diffraction theory show that under the illumination of the SIL-NIF-polymer composite by a sharp focused radially polarized beam, the composite configuration under investigation can substantially increase the spot intensity, suppress the spot expansion along the distance from the interface, and improve the depth of focus, in comparison with conventional focusing systems using bare SILs. In the case where a photoresist film is placed near the composite configuration, a subtle deep-etching pattern with high resolution can be achieved.