Abstract
Abstract The onset of electron emission at modest electric fields can be promoted by treating boron doped thin film CVD diamond with well chosen combinations of gas bombardment and/or gas treatments. The latter are more successful in promoting the highest levels of current density and would appear to be a promising method for using relatively stable crystalline material for cold cathode applications. The exact nature of the modifications that take place are not clear but a combination of increasing the conductivity of electron pathways through the thin film with a lowering of surface work function is implicated.
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