Enhancing anti-reflective properties of electronic glass through two-step chemical etching

Abstract

With the rapid growth of the electronic display industry, aluminosilicate glass has emerged as a replacement for traditional soda lime silica glass as the cover plate of various display devices because of its excellent physical and chemical properties. High transmittance and low reflectivity are the inevitable requirements of its application. However, few studies have been reported about the antireflection of aluminosilicate glass. In this study, a two-step etching method was employed to treat both sides of the alkali-aluminosilicate glass to obtain surface antireflection. Analytical methods such as EPMA, AFM, and UV spectrophotometry were utilized to evaluate the effect of the etching process and resultant surface microstructure on the optical properties of the glass. Furthermore, comparative research was conducted to distinguish the etching reaction differences between alkali-aluminosilicate glass and other glass compositions like soda-lime glass and high-boron-silicon glass. The results demonstrated that the controlled two-step etching process created a micro-porous surface structure, with a gradient refractive index. Subsequent to the secondary etching, the glass exhibits an impressive average transmittance of 98.88% within the visible light spectrum (380–780 nm). Moreover, identical etchant across different composition glasses leads to discernible differences in transmittance.