Enhancing Acceptor-Based Optical Behavior in Phosphorus-Doped ZnO Thin Films Using Boron as Compensating Species

Abstract

The modulating nature of doping in oxide-based semiconductors has always been an area of interest as it resulted in numerous technological developments. On working with ZnO, the principal challenge faced in its realistic utilization as an optoelectronic material lies in its default n-type of nature due to the presence of native defects. Thus, achieving p-type behavior has been a tedious job, and considerable efforts have been made over the past couple of decades. The incorporation of monodopants has yielded p-type ZnO of unstable reliability, thus spurring research on codoping technology. In present study, we examined the effects of boron implantation time on the structural and optical properties of phosphorus-doped ZnO thin films, with the objective of realizing a material ideal for optoelectronic applications. Furthermore, we investigated the effects of annealing temperature on the behavior of codoped samples. Field emission gun scanning electron microscopy, high-resolution X-ray diffraction, X-ray phot...