Enhancement Source of Quadrupolar Interaction by Surface Plasmons Waves

Abstract

This work considers an optical system that operates by both quadrupole transition and evanescent surface plasmons waves. The surface plasmons waves is generated by the total internal reflection, and its intensity is distributed in the vicinity of the surface. The theory of such an optical system is constructed, assuming the quadrupole transition is only allowed, and then the quadrupole optical forces and the ensuing reflection of Cesium atoms is shown. The emphasis here is on the role of the metallic capping layer with a finite thickness and a finite plasma frequency on the evaluation of atomic reflection processes. A desirable enhancement of the evanescent plasmons waves magnitude is obtained. At the same time, a significant decrease in the atom-surface attraction, which is considered one of the biggest obstacles in the atomic reflection process, is achieved. The performance of the atomic reflection process and some associated factors are pointed out and discussed.