Enhancement of photodetector performance of aluminum-doped zinc oxide thin films fabricated via SILAR method: Structural, optical, and electrical analysis

Abstract

This study presents a comprehensive analysis of the structural, optical, electrical, and photosensing characteristics of aluminum-doped zinc oxide (Al:ZnO) thin films, fabricated via successive ionic layer adsorption and reaction (SILAR) techniques. The Raman and X-ray diffraction (XRD) analyses validated the hexagonal wurtzite structure and revealed that Al doping enhances crystallinity and crystal growth of ZnO. The average crystallite size increased from 21.6 nm in undoped sample to 23.8 nm in 5.0 wt% Al-doped sample, while strain effects decreased from 4.67 × 10-3 to 4.36 × 10-3. Scanning electron microscopy (SEM) images revealed improved film morphology and more defined geometries with increased Al doping, while energy-dispersive X-ray analysis (EDAX) confirmed successful Al integration into the ZnO lattice. Optical analyses indicate a narrowing of the ZnO bandgap to 2.81 eV in 5.0 wt% Al:ZnO from 3.02 eV in the undoped variant, while photoluminescence (PL) peak positions remains unchanged. Time-resolved fluorescence (TRF) indicated a reduction in electron lifetime with higher Al doping. Furthermore, Hall effect assessments reveal a decrease in carrier mobility and electrical resistivity, alongside a rise in carrier concentration with higher Al content. The photodetection efficacy was substantially improved with Al doping, particularly at 2.5 wt% Al, achieving a responsivity of 42.5 × 10-2 A/W, external quantum efficiency of 99.3 %, and detectivity of 1.8 × 1011 Jones. These findings exhibit that Al-doping substantially enhances the photodetection properties of ZnO thin films.