Abstract
The perpendicular magnetic anisotropy (PMA) and the anomalous Hall effect (AHE) in Co/Ni multilayer were optimized by manipulating its interface structure (inducing HfO2 capping layer and Pt insertion) and post-annealing treatment. A strong PMA can be obtained in Co/Ni multilayers with HfO2 capping layer even after annealing at 400°C. The heavy metal Hf may improve the interfacial spin-orbit coupling, which responsible for the enhanced PMA and high annealing stability. Moreover, the multilayer containing HfO2 capping layer also exhibited high saturation anomalous Hall resistivity through post-annealing, which is 0.85μΩcm after annealing at 375°C, 211% larger than in the sample at deposited state which is only 0.27μΩcm. The enhancement of AHE is mainly attributed to the interface scattering through post-annealing treatment.
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