Abstract
Abstract We developed the direct patterning process of the ZrO 2 high-aspect-ratio (HAR) pattern for light-extraction efficiency of GaN-based blue light-emitting diodes (LEDs). ZrO 2 HAR pattern, which has relatively high refractive index and acts as scattering layer, was formed on GaN-based blue LEDs using ultraviolet-nanoimprint lithography (UV-NIL) with mixture of ZrO 2 nanoparticle and monomer. The photons generated from the multi-quantum well layer can escape the ITO (Indium Tin Oxide) layer more easily due to gradual refractive index and optical path that increased via waveguide mode. The ZrO 2 patterned LED with high pattern density showed the high brightness in same input current. The patterned LED with pitch of 1 µm showed the 25.7% higher light output power than a un-patterned LED at a driving current of 20 mA.
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