Abstract
Extreme ultraviolet (EUV) reflective multilayers that contain a Ru barrier layer at the Mo-on-Si interface were deposited by multitarget magnetron sputtering. The microstructure, stacking quality, and optical properties of these multilayers were analyzed by X-ray diffraction (XRD), transmission electron microscope (TEM), and EUV reflectometry. The multilayers with a Ru barrier showed a more distinct Ru-on-Si interface and suppressed interfacial mixing during deposition. As a result, the peak reflectivity and Full width at half maximum (FWHM) were improved by 1.7% and 50%, respectively, as compared to the conventional Mo/Si multilayer structure.
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