Abstract
An enhancement-mode (E-mode) AlN/GaN/AlGaN double-heterojunction field-effect transistor (DHFET) with record high-frequency performance is reported. E-mode operation was achieved through vertical scaling of the AlN barrier layer. Parasitic resistances were reduced through ohmic contact recess etching followed by regrowth of n+ GaN by molecular-beam epitaxy and SiN deposition to increase the sheet charge density in the access regions of the device, resulting in an extremely low on-resistance of 1.06 Ω · mm. A DHFET with an 80-nm gate length had a threshold voltage of 0.21 V, an extrinsic transconductance (g <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub> ) of 0.70 S/mm, a current-gain cutoff frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> ) of 112 GHz, and a maximum oscillation frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> ) of 215 GHz. To our knowledge, these are the highest g <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">m</sub> , f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> , and f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> values reported to date for an E-mode GaN HFET.
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