Enhanced thickness uniformity of large-scale α-Ga2O3 epilayers grown by vertical hot-wall mist chemical vapor deposition

Abstract

Smooth surface morphology and high thickness uniformity heteroepitaxy of corundum-structured ( α- ) gallium oxide (Ga 2 O 3 ) crystalline thin films on 100-mm diameter c -plane sapphire substrates were successfully demonstrated using vertical hot-wall mist chemical vapor deposition (CVD). The growth rate and surface morphology of the epitaxial layers were numerically and experimentally found to be dependent on the diameter of the precursor-diluted microdroplets approaching the substrate surface. Since the microdroplet is gradually evaporated while traveling through the furnace, the growth variables such as temperature, mist-flow velocity, and substrate position were tuned to obtain a suitable diameter of microdroplets approaching the substrate. In this study, the diameter of the approaching microdroplet was ≈2 μm, which was optimal for the smooth surface (root mean square roughness ≈1 nm) of α -Ga 2 O 3 epitaxial layers with a growth rate of ≈230 nm/h. Due to the even flow of mist in the vertical furnace, high thickness uniformity of the α -Ga 2 O 3 epitaxial layer is guaranteed on large-scale substrates, with a standard deviation of thickness as small as 28 nm, paving the way for highly reliable Ga 2 O 3 -based electric and optoelectronic devices.