Abstract

Herein the effects of aluminum nanosheets on the structural, morphological, optical and electrical properties of tungsten oxide thin films are reported. Polycrystalline phase of the thermally evaporated WO3 was achieved by the pulsed laser welding technique. The polycrystalline films are then coated with Al nanosheets of thicknesses of 100 nm and 150 nm by the ion coating technique. It is observed that Al induces the domination of the hexagonal structure of WO3 over the tetragonal. Associated with the enhanced crystallinity the light absorption in the films increased by more than 60% and the energy band gap narrowed significantly. Namely the energy band gap of the as grown WO3 decreased from 3.15 eV to 2.85 eV and 2.59 eV as the Al layer thickness increased from 100 to 150 nm, respectively. It is also observed that crystalline films of WO3 exhibited lower electrical resistivity compared to films fabricated by other techniques. The temperature dependent electrical resistivity measurement was carried out in the temperature range of 310–420 K. It showed room temperature values of 2.5 ( Ω cm), 2.2 ( Ω cm) and 1.9 ( Ω cm) and impurity levels centered at 0.25 eV, 0.34 eV and 0.16 eV for uncoated and films coated with Al nanosheets of thicknesses of 100 nm and 150 nm, respectively. The enhanced crystallinity that is accompanied with narrower energy band gap and lower electrical resistivity values make crystalline WO3 films promising for optoelectronic applications.

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