Abstract
In this paper, the enhanced photoluminescence from CdS thin film with SiO2 nanopillar array (NPA) was demonstrated. The CdS was prepared using chemical bath deposition in a solution bath containing CdSO4, SC(NH2)2, and NH4OH. The SiO2 NPA was fabricated by the nanosphere lithography (NSL) techniques. The nanopillar is about 50 nm in diameter, and the height is 150 nm. As a result, the sample with NPA shows an obvious improvement of photoluminescence (PL), compared with the one without NPA. In addition, we also observed that the PL intensity is increased ~5 times if the active layer is deposited on the nanopillar arrays and covered by a thin metal film of Al. It is noteworthy that the enhancement of photoluminescence could be attributed to the roughness of the surface, the 2D photonic band gap (PBG) effect and the surface plasmon resonance (SPR) effects.
Highlights
In this paper, the enhanced photoluminescence from Cadmium sulfide (CdS) thin film with SiO2 nanopillar array (NPA) was demonstrated
The SiO2 NPA was fabricated by the nanosphere lithography (NSL) techniques
It is noteworthy that the enhancement of photoluminescence could be attributed to the roughness of the surface, the 2D photonic band gap (PBG) effect and the surface plasmon resonance (SPR) effects
Summary
Wei Li1,2,3, Shaolei Wang[1,2], Sufeng He1,2, Jing Wang[1,2], Yanyan Guo1,2 & Yufeng Guo[1,2] received: 21 January 2015 accepted: 26 May 2015 Published: 16 June 2015. We observed that the PL intensity is increased ~5 times if the active layer is deposited on the nanopillar arrays and covered by a thin metal film of Al. It is noteworthy that the enhancement of photoluminescence could be attributed to the roughness of the surface, the 2D photonic band gap (PBG) effect and the surface plasmon resonance (SPR) effects. Nanosphere lithography is a well-know method to fabricate order nanopillar array[9,10,11] This technique makes PS spheres to form large single or double layer, close packed arrays driven by capillary forces. Photonics crystal patterns with photonic band gap are well fabricated by nanosphere lithography on the SiO2 substrate and the effects of such nanostructures on the optical properties have been studied. It is observed that about 5 times increase of photoluminescence emitted from this nanostructure
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