Abstract
In this article, Hafnium oxide (HfO2) overlayer was reported to be loaded on the surface of WO3 nanoparticles by a simple solvothermal method for the first time. HfO2 powders were dissolved in the concentrated sulfuric acid as raw material. The physicochemical properties of WO3 nanoparticles with and without HfO2 passivation layer were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FTIR). For the film electrode prepared with doctor-blade method, scanning electron microscopy (SEM) and UV–vis absorbance spectroscopy (UV–vis) were used to determine the morphological and optical properties. Meantime, the photoelectrochemical properties of two samples were evaluated by means of liner sweep voltammogram, electrochemical impedance spectroscopy (EIS), intensity modulated photocurrent spectrum (IMPS) and incident photon to current conversion efficiency (IPCE). The WO3 film with HfO2 passivation layer showed better photoelectrochemical performance which could be ascribed to the inhibition of the recombination of electron-holes.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
