Enhanced performance for solar cells with moth-eye structure fabricated by UV nanoimprint lithography

Abstract

► We reported a UV nanoimprinting method with the direct use of free standing AAO membrane. ► We completed moth-eye structure fabrication at room temperature and normal atmosphere. ► We applied the nanoimprinting method to antireflection application of solar cells and achieved satisfactory performance. Moth-eye structures were fabricated on monocrystalline silicon and monocrystalline silicon P-N junction solar cell surface respectively, using anodized aluminum oxide (AAO) membrane as a mask by means of UV nanoimprint lithography. A nano-scale pattern of porous alumina membrane mask was transferred to the UV-curable precursor with high fidelity by a fabrication process conducted at room temperature and normal atmosphere. The antireflection film reduced the surface reflection to about 4% in the wavelength of 425–1200 nm for silicon and improved the conversion efficiency by 19% for solar cells. The moderate fabrication condition made the method suitable for applications in different kinds of solar cells.