Abstract

CVD diamond coating was deposited on to 13%wt. Co -containing tungsten cemented carbide surfaces using a hot filament chemical vapor deposition (HFCVD) to improve wear properties and performance of WC -13% wt . Co . Prior to the deposition of the diamond films, a W - C gradient intermediate layer had been sputtered on WC -13% wt . Co . The surface and cross-section morphology, phase transformation, and grain size distribution of the samples were investigated by means of field emission scanning electron microscope (SEM), X-ray diffractometer (XRD), and atomic force microscope (AFM), respectively. The results show that W - C gradient intermediate layers can effectively reduce the diffusion of Co in cemented carbide substrates during diamond deposition process, resulting high nucleation density and ultra smooth nanocrystalline diamond films.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call