Abstract
The chemical composition, structure and mechanical properties of hafnium oxide films with different nitrogen constituents were investigated. X-ray photoelectron spectrum analysis showed that nitrogen atoms acted as oxygen substitution and interstitial atoms. The crystalline features exhibited no change during nitrogen doping. Nevertheless, the films with high compressive stress displayed significantly enhanced mechanical properties. The enhanced mechanism could mainly be attributed to the dislocation obstacle motion by inserting nitrogen atoms.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
