Enhanced magnetic anisotropy and its thermal stability in obliquely deposited Co-Film on the nanopatterned substrate

Abstract

The deliberate manipulation of magnetic anisotropy through controlled adjustments to surface and interface morphology has become important due to its potential applications in spintronics and magnetic memory devices. In the present work, oblique angle deposition (OAD) at 65° to the surface normal on a rippled substrate, keeping nanopatterns on the SiO2 substrate perpendicular to the OAD projection, has been used to induce in-plane uniaxial magnetic anisotropy (UMA) and its thermal stability in cobalt (Co) thin film. Prior to film preparation, the patterned substrate of wavelength 68 ± 4 nm and amplitude 3.4 ± 0.2 nm was prepared separately using a low-energy ion beam erosion (IBE) process. Grazing incidence small-angle X-ray scattering (GISAXS) and magneto-optical Kerr effect (MOKE) techniques have been used for film characterization. While GISAXS provided information about film structure and morphology, MOKE provided information about magnetic properties, thus making it possible to correlate the temperature-dependent evolution of morphology with that of UMA in the film. A clear anisotropy in the growth of Co film is found to result in strong UMA. Unlike previous studies, which typically observe a reduction in UMA strength with thermal annealing, the present work demonstrates a 31 % increase in UMA strength after annealing up to 200 °C, underscoring the importance of oblique angle deposition on nano-rippled substrates for achieving high UMA and ensuring its thermal stability up to moderate temperatures. The appearance of large UMA and its unusual temperature dependence is understood in terms of the shadowing effects and column coalescence, resulting in more robust shape anisotropy. This work provides insights into morphological anisotropy, elucidating the interplay of shadowing effects, shape anisotropy, and dipolar interactions within interacting column and ripple structures. This method gives rise to morphology-induced anisotropy, which can also be applied to other ferromagnetic films to enhance the magnetic anisotropy and ensure thermal stability.