Enhanced low-field positive magnetoresistance and magnetic anisotropy in La0.7Sr0.3MnO3 films grown on (001) Si

Abstract

Strong anisotropy is observed in the magnetization and magnetoresistance (MR) of a series of La0.7Sr0.3MnO3 (LSMO) films grown on (001) oriented Si using pulsed sputtering plasma. Magnetic anisotropy (MA) of LSMO films is in the order of 106 erg/cm3, comparable to or larger than that of the other heterostructures. Analysis using the Stoner-Wohlfarth model and the density functional theory (DFT) indicates that the crystalline and induced anisotropies are almost compensating with each other, and observed MA is of the same order of shape anisotropy. The rise in MA with the LSMO thickness is attributed to the shape anisotropy and interfacial spin reordering. These LSMO films exhibit positive and negative MR, even though the LSMO is well known for colossal negative MR. The 12.4 nm thick LSMO film shows a maximum ∼7 % in-plane low-field positive MR, which increases to ∼12 % for 20.0 nm thick LSMO, but the variation of out-of-plane positive MR is ∼ ± 0.8 %. The maximum in-plane positive MR occurs at ∼ ± 0.2 kG (switching field), which corresponds to the coercive field. In contrast, the out-of-plane positive MR switching field is relatively higher, ∼ ± 5 kG, 25 times larger than the in-plane switching field. The anisotropy in positive MR and its switching field is due to the strong MA, modulated by the charge transfer-induced interfacial exchange coupling strength, confirmed using the DFT. The MA and anisotropy in MR with the dual sign of MR are intriguing phenomena; their tunability could pave the way for advanced technology in magnetic devices.